Tris(dimethylphenylphosphine)](2,5-norbornadiene)rhodium(I) hexafluorophosphate [三(二甲基苯基膦)](2,5-降冰片二烯)六氟磷酸铑(I)
CAS 32761-50-5 MFCD02091681
化学结构图
SMILES: [Rh+].CP(C)C1C=CC=CC=1.CP(C)C1C=CC=CC=1.CP(C)C1C=CC=CC=1.F[P-](F)(F)(F)(F)F.C1C2[CH][CH]C1[CH][CH]2 |^1:37,38,40,41|
化学属性
| Mol. Formula | C31H41F6P4Rh |
|---|---|
| Mol. Weight | 754.45 |
| Melting Point | 158-161 °C (lit.) |
别名和识别编码
| Chemical Name | Tris(dimethylphenylphosphine)](2,5-norbornadiene)rhodium(I) hexafluorophosphate |
|---|---|
| Synonym | [(2,3-η)-Bicyclo[2.2.1]hepta-2,5-diene]tris(dimethylphenylphosphine)rhodium(I) hexafluorophosphate [三(二甲基苯基膦)](2,5-降冰片二烯)六氟磷酸铑(I) |
| MDL Number | MFCD02091681 |
| PubChem Substance ID | 24860485 |
| Chemical Name Translation | [三(二甲基苯基膦)](2,5-降冰片二烯)六氟磷酸铑(I) |
| CAS Number | 32761-50-5 |
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分类
- {SNA} Alicyclic/Etch-Resistant Monomers, Catalysis and Inorganic Chemistry, Chemical Synthesis, Lithography Monomers, Materials Science, Micro/NanoElectronics, Rhodium, Self Assembly & Contact Printing
- {SNA} Alicyclic/Etch-Resistant Monomers, Catalysis and Inorganic Chemistry, Chemical Synthesis, Lithography Monomers,
安全信息
GHS Symbol
- P261 Avoid breathing dust/fume/gas/mist/vapours/spray. 避免吸入粉尘/烟/气体/烟雾/蒸汽/喷雾。
- P305+P351+P338
- H315 Causes skin irritation 会刺激皮肤
- H319 Causes serious eye irritation 严重刺激眼睛
- H335 May cause respiratory irritation 可能导致呼吸道刺激
- S37/39 Wear suitable gloves and eye/face protection 穿戴适当的手套和眼睛/面保护；
- S26 In case of contact with eyes, rinse immediately with plenty of water and seek medical advice 眼睛接触后，立即用大量水冲洗并征求医生意见；
- R36/37/38 Irritating to eyes, respiratory system and skin 对眼睛、呼吸系统和皮肤有刺激性
