5-Norbornene-2-Endo,3-Endo-Dimethanol 5-降冰片烯-2-内,3-内-二甲醇

CAS 699-97-8 MFCD00674044

化学结构图

699-97-8
SMILES: OC[C@@H]1[C@H]2C[C@H](C=C2)[C@@H]1CO |&1:2,3,5,8|

化学属性

Mol. FormulaC9H14O2
Mol. Weight154.21
Boiling Point130 °C at 1 mmHg
Melting Point86 °C
TSCANo

别名和识别编码

Chemical Name5-Norbornene-2-Endo,3-Endo-Dimethanol
Synonym rel-(1R,2S,3R,4S)-Bicyclo[2.2.1]hept-5-ene-2,3-dimethanol {LY} rel-(1R,2S,3R,4S)-Bicyclo[2.2.1]hept-5-ene-2,3-dimethanol {} {LY} rel-(1R,2S,3R,4S)-Bicyclo[2.2.1]hept-5-ene-2,3-dimethanol {} {} {LY} rel-(1R,2S,3R,4S)-Bicyclo[2.2.1]hept-5-ene-2,3-dimethanol {} {} {} {LY} rel-(1R,2S,3R,4S)-Bicyclo[2.2.1]hept-5-ene-2,3-dimethanol {} {} {} {} {LY} rel-(1R,2S,3R,4S)-Bicyclo[2.2.1]hept-5-ene-2,3-dimethanol {} {} {} {} {} {LY} rel-(1R,2S,3R,4S)-Bicyclo[2.2.1]hept-5-ene-2,3-dimethanol {} {} {} {} {} {} {LY} rel-(1R,2S,3R,4S)-Bicyclo[2.2.1]hept-5-ene-2,3-dimethanol {} {} {} {} {} {} {} {LY} rel-(1R,2S,3R,4S)-Bicyclo[2.2.1]hept-5-ene-2,3-dimethanol {} {} {} {} {} {} {} {} {LY} rel-(1R,2S,3R,4S)-Bicyclo[2.2.1]hept-5-ene-2,3-dimethanol {} {} {} {} {} {} {} {} {} {LY} rel-(1R,2S,3R,4S)-Bicyclo[2.2.1]hept-5-ene-2,3-dimethanol {} {} {} {} {} {} {} {} {} {} {LY} rel-(1R,2S,3R,4S)-Bicyclo[2.2.1]hept-5-ene-2,3-dimethanol {} {} {} {} {} {} {} {} {} {} {} {} {} {} {} {} {} {} {} {} {} {
MDL NumberMFCD00674044
CAS Number699-97-8
PubChem Substance ID24869639
Reaxys-RN1365254
Beilstein Registry Number6(4)5531
Chemical Name Translation5-降冰片烯-2-内,3-内-二甲醇
Canonical SMILESOC[C@H]1[C@H]2C=C[C@@H]([C@H]1CO)C2
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分类

  • {SNA} Alicyclic/Etch-Resistant Monomers, Lithography Monomers, Micro/NanoElectronics, Monomers, Norbornene Monomers, Polymer Science, Self Assembly & Contact Printing, 材料科学
  • {SNA} Alicyclic/Etch-Resistant Monomers, Lithography Monomers, Materials Science, Micro/NanoElectronics, Monomers, Norbornene Monomers, Polymer Science, Self Assembly & Contact Printing
  • {uni_hamburg} no charge; carbocycle; alicycle; fused rings; 5ring; 6ring; alcohol
  • {SNA} Alicyclic/Etch-Resistant Monomers, Lithography Monomers, Micro/NanoElectronics, Monomers, Norbornene Monomers, Polymer Science, Self Assembly and Lithography, 材料科学

相关文献及参考

  • Short: IV/8A Title: Enthalpies of Fusion and Transition of Organic Compounds Author: Zhang, Z.-Y.; Frenkel, M.; March, K.N.; Wilhoit, R.C. Editor: Marsh, K.N. Source: Landolt-Börnstein, New Series Volume: IV/8A Year: 1995 Keyword: organic compounds; enthaly of fusion; melting point; phase transition ISBN: 3-540-58854-X ISBN: 978-3-540-58854-2 Internet Resource: DOI:10.1007/b55145 RefComment: VIII, 588 pages.

安全信息

WGK Germany3
GHS Symbol
Precautionary statements
  • P280 Wear protective gloves/protective clothing/eye protection/face protection. 戴防护手套/防护服/眼睛的保护物/面部保护物。
  • P362 Take off contaminated clothing and wash before reuse. 脱掉污染的衣服，清洗后方可重新使用
  • P264 Wash hands thoroughly after handling. 处理后要彻底洗净双手。
  • P332+P313
  • P305+P351+P338+P337+P313
  • P302+P350
  • P261 Avoid breathing dust/fume/gas/mist/vapours/spray. 避免吸入粉尘/烟/气体/烟雾/蒸汽/喷雾。
  • P305+P351+P338
  • P337+P313
  • P302+P352+P332+P313+P362+P364
Hazard statements
  • H315 Causes skin irritation 会刺激皮肤
  • H319 Causes serious eye irritation 严重刺激眼睛
  • H335 May cause respiratory irritation 可能导致呼吸道刺激
Signal word Warning
Personal Protective Equipment dust mask type N95 (US), Eyeshields, Gloves
Safety Statements
  • S26 In case of contact with eyes, rinse immediately with plenty of water and seek medical advice 眼睛接触后，立即用大量水冲洗并征求医生意见；
  • S36 Wear suitable protective clothing 穿戴适当的防护服；
  • S60 This material and its container must be disposed of as hazardous waste 该物质及其容器必须作为危险废物处置；
  • S37 Wear suitable gloves 戴适当手套；
Risk Statements
  • R36/37/38 Irritating to eyes, respiratory system and skin 对眼睛、呼吸系统和皮肤有刺激性
Hazard Codes Xi
Storage condition

系列性分类

  1. Materials Science 材料科学
  2. Micro/NanoElectronics - Materials Science
  3. Self Assembly & Contact Printing - Micro/NanoElectronics
  4. Lithography Monomers - Self Assembly & Contact Printing
  5. Alicyclic/Etch-Resistant Monomers - Lithography Monomers

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