BIS[BIS(TRIMETHYLSILYL)AMINO]TIN II 双[双(三甲基甲硅烷基)氨基]锡(II)
CAS 59863-13-7 MFCD00191794
化学结构图
SMILES: C[Si](C)(C)N([Sn]N([Si](C)(C)C)[Si](C)(C)C)[Si](C)(C)C
化学属性
| Mol. Formula | [[(CH3)3Si]2N]2Sn |
|---|---|
| Mol. Weight | 439 |
| Refractive index | n20/D 1.514(lit.) |
| Boiling Point | 112 °C/0.05 mmHg(lit.) |
| Density | 1.136 g/mL at 25 °C(lit.) |
| Melting Point | 37-38 °C(lit.) |
别名和识别编码
| Chemical Name | Bis[bis(trimethylsilyl)amino]tin(II) |
|---|---|
| CAS Number | 59863-13-7 |
| PubChem Substance ID | 24865662 |
| MDL Number | MFCD00191794 |
| Chemical Name Translation | 双[双(三甲基甲硅烷基)氨基]锡(II) |
| Synonym | 双[双(三甲基甲硅烷基)氨基]锡(II) |
信息真实价格透明
资金保障
专业采购外包团队在线服务
信息真实价格透明
资金保障
专业采购外包团队在线服务
品牌质保精细包装
现货库存
一流品牌服务
分类
- {SNA} CVD and ALD Precursors by Metal, Micro/NanoElectronics, Tin, Vapor Deposition Precursors, 材料科学
- {SNA} CVD and ALD Precursors by Metal, Materials Science, Micro/NanoElectronics, Tin, Vapor Deposition Precursors
- CVD and ALD Precursors by Metal, Materials Science, Micro/NanoElectronics, Tin, Vapor Deposition Precursors
相关文献及参考
- 1. Synlett , 131, (1993)
- 2. J. Org. Chem. 57 , 5063, (1992)
- FT-IR 2 (3), 4397:B / Structure Index 1 , 472:A:5
安全信息
GHS Symbol
- H228 Flammable solid 易燃固体
- H315 Causes skin irritation 会刺激皮肤
- H319 Causes serious eye irritation 严重刺激眼睛
- H335 May cause respiratory irritation 可能导致呼吸道刺激
- P210 Keep away from heat/sparks/open flames/hot surfaces. — No smoking. 远离热源/火花/明火/热的表面。——禁止吸烟。
- P261 Avoid breathing dust/fume/gas/mist/vapours/spray. 避免吸入粉尘/烟/气体/烟雾/蒸汽/喷雾。
- P305+P351+P338
- S26 In case of contact with eyes, rinse immediately with plenty of water and seek medical advice 眼睛接触后，立即用大量水冲洗并征求医生意见；
- S36 Wear suitable protective clothing 穿戴适当的防护服；
- R36/37/38 Irritating to eyes, respiratory system and skin 对眼睛、呼吸系统和皮肤有刺激性
