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• {SNA} Manganese, Micro/NanoElectronics, Solution Deposition Precursors, 材料科学
• {SA} Manganese, Materials Science, Micro/NanoElectronics, Solution Deposition Precursors
• Manganese, Materials Science, Micro/NanoElectronics, Solution Deposition Precursors

相关文献及参考

• 3. J. Org. Chem. 62 , 6978, (1997)
• Selective oxidizing agent in a variety of applications, usually involving free-radical mechanisms (compare Lead(IV)­ acetate, A15551). For brief reviews, see: J. Prakt. Chem./ Chem. Ztg., 339, 488 (1997); Synlett, 835 (2002). Examples:
• Acetoxylation of benzylic or allylic C-H bonds: Chem. Commun., 507 (1970); J. Chem. Soc. (C), 2355 (1971); J. Org. Chem., 45, 3906 (1980); methylene groups ɑ- to a conjugated ketone can also be acetoxylated: Tetrahedron Lett., 25, 5839 (1984); Synthesis, 1119 (1990). For an improved procedure for the acetoxylation of enones in acetic acid, see: Tetrahedron, 60, 3427 (2004). Arylation of active methylene compounds: J. Org. Chem., 54, 2703, 2713 (1989). Reaction of olefins with carboxylic acids to give -lactones: J. Am. Chem. Soc., 96, 7977 (1974); J. Am. Chem. Soc., 106, 5384 (1984). Reaction with cyanoacetic or malonic acids gives the appropriate ɑ-substituted -lactones: Tetrahedron Lett., 26, 4291 (1985). For a review of Mn(III)-mediated reactions of unsaturated systems, see: Synthesis, 833 (1993). See also Diethyl­ allyl­malonate, L02286. For a review of Mn(III)-based oxidative free-radical cyclizations, see: Chem. Rev., 96, 339 (1996).
• 2. Chem. Rev. 96 , 339, (1996) 摘要
• With arylboronic acids the corresponding radicals are generated, which can couple with aromatic or heteroaromatic (furan, thiophene) solvents to give biaryls and heterobiaryls in good yields. Various sensitive functional groups are tolerated: J. Org. Chem., 68, 578 (2003).
• With arylboronic acids the corresponding radicals are gene

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