Zirconium(IV) Tert-Butoxide 四叔丁醇锆

CAS 2081-12-1 MFCD00075085

化学结构图

2081-12-1
SMILES: CC(C)(C)O[Zr](OC(C)(C)C)(OC(C)(C)C)OC(C)(C)C

化学属性

Mol. FormulaZr[OC(CH3)3]4
Mol. Weight383.68
Refractive indexn20/D 1.424(lit.)
Boiling Point81 °C/3 mmHg(lit.)
Density0.985 g/mL at 25 °C(lit.)
Flash Point85°(185°F)
TSCANo
Melting Point3°C
Appearance slightly yellow liq.
Stabilitymoisture sensitive, store cold

别名和识别编码

Chemical NameZirconium(IV) Tert-Butoxide
Synonym ZIRCONIUM T-BUTOXIDE 四叔丁醇锆 Zirconium (IV) tert-butoxide Zirconium tert-butanolate ZIRKONIUM(IV) TERT-BUTOXIDE ZIRKON(IV)-TERT-BUTOXID Zirconium(IV)t-butoxide(99.99%-Zr)PURATREM Zirconium(IV) tert-butoxide, 99% (metals basis) 四叔丁醇锆(IV), 99.99% (METALS BASIS) 叔丁醇锆 Tetra-tert-butyl zirconate Zirconium(IV) t-butoxide 四叔丁醇锆(IV), 99% (METALS BASIS) Tetra-tert-butoxyzirconium; Tetrakis(tert-butanolato)zirconium; Tetrakis(tert-butoxy)zirconium; Zirconium tert-butanolate; Zirconium tert-butoxide; Zirconium tetra-t-butoxide; Zirconium tetra-tert-butoxide; Zirconium tetrakis(tert-butoxide); Zirconium(4+) tert-butoxide; Zirconium(IV) tert-butanolate; Zirconium(IV) tert-butoxide; tert-Butanol zirconium(4+) salt Orthozirkonsäure-tert.-butylester Zirconium(IV) tert-butoxide, 97+% Zirconium(IV) tert-butoxide Tetra-tert-butoxyzirconium ZTB Zirconium tert-butanolate 四叔丁氧化锆 ZIRCONIUM TERT-BUTOXIDE ZIRCONIUM(IV) TERT-BUTOXIDE, 99.999% ZTB ZIRCONIUM(IV) TERT-BUTOXIDE ZIRCONIUM TETRA-T-BUTOXIDE 四叔丁醇锆(IV), 97+% 四叔丁氧化锆 Zirconium(IV)t-butoxide,99% Tetra-tert-butoxyzirconium TETRA-TERT-BUTYL ZIRCONATE ZIRCONIUM(IV)T-BUTOXIDE zirconium tetrakis-(tert-butoxide) Zirconium(IV) tert-butoxide, 99.95% ZIRCONIUM(IV) T-BUTOXIDE: 99.99% Zirkon(IV)-tert.-butylat 2-Propanol, 2-methyl-, zirconium(4+) salt Zirkon(IV)-tert.-butoxid Zirconium(IV) tert-butoxide, 99.99
CAS Number2081-12-1
PubChem Substance ID329766792
Beilstein Registry Number3681870
MDL NumberMFCD00075085
EC Number000-000-0
Chemical Name Translation四叔丁醇锆
LabNetwork Molecule IDLN02144733
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分类

  • {SNA} 40: Zirconium, CVD and ALD Precursors Packaged for Deposition Systems, Materials Science, Micro/NanoElectronics, Vapor Deposition Precursors
  • {SNA} 40: Zirconium, CVD and ALD Precursors Packaged for Deposition Systems, Micro/NanoElectronics, Vapor Deposition Precursors, 材料科学
  • {uni_hamburg} no charge; 1fragment
  • {SNA} Catalysis and Inorganic Chemistry, Chemical Synthesis, Micro/NanoElectronics, Solution Deposition Precursors, Zirconium, 材料科学
  • {SNA} Catalysis and Inorganic Chemistry, Chemical Synthesis, Materials Science, Micro/NanoElectronics, Solution Deposition Precursors, Zirconium

相关文献及参考

  • Catalyst for an improved version of the Oppenauer oxidation of primary and secondary alcohols to aldehydes and ketones (see Aluminum tert-butoxide, A16954, and Aluminum isopropoxide, 14007) which proceeds at room temperature in the presence of substoichiometric amounts of the catalyst, a moderate excess of chloral as the hydride acceptor and 3-an
  • Catalyst for an improved version of the Oppenauer oxidation of primary and secondary alcohols to aldehydes and ketones (see Aluminum tert-butoxide, A16954, and Aluminum isopropoxide, 14007) which proceeds at room temperature in the presence of substoichiometric amounts of the catalyst, a moderate excess of chloral as the hydride acceptor and 3-angstrom molecular sieves to prevent hydrolysis of the catalyst: Synthesis, 1341 (1996). In a related method, the reagent is used catalytically in the presence of t-butyl hydroperoxide or cumene hydroperoxide as the hydride acceptor under anhydrous conditions: J. Org. Chem., 61, 1467 (1996).
  • Short: IV/18A
  • Short: IV/20B

安全信息

GHS Symbol
WGK Germany3
Hazard statements
  • H315 Causes skin irritation 会刺激皮肤
  • H319 Causes serious eye irritation 严重刺激眼睛
  • H335 May cause respiratory irritation 可能导致呼吸道刺激
Personal Protective Equipment Eyeshields, full-face respirator (US), Gloves, multi-purpose combination respirator cartridge (US), type ABEK (EN14387) respirator filter
Hazard Codes Xi
Precautionary statements
  • P261 Avoid breathing dust/fume/gas/mist/vapours/spray. 避免吸入粉尘/烟/气体/烟雾/蒸汽/喷雾。
  • P305+P351+P338
Signal word Warning
Safety Statements
  • S60 This material and its container must be disposed of as hazardous waste 该物质及其容器必须作为危险废物处置；
  • S26 In case of contact with eyes, rinse immediately with plenty of water and seek medical advice 眼睛接触后，立即用大量水冲洗并征求医生意见；
  • S37 Wear suitable gloves 戴适当手套；
  • S36 Wear suitable protective clothing 穿戴适当的防护服；
Risk Statements
  • R36/37/38 Irritating to eyes, respiratory system and skin 对眼睛、呼吸系统和皮肤有刺激性
  • R36/38 Irritating to eyes and skin 对眼睛和皮肤有刺激性
Storage condition Moisture & Light Sensitive 2-8°C
UN Number UN2924 1993
Packing GroupIII
Hazard Class3
Restrict 危险品

其他信息

  • 叔丁醇锆价格(试剂级):更新日期 产品编号 产品名称 包装 价格 2010/05/25 39547 四叔丁醇锆(IV), 99% (metals basis) Zirconium(IV) tert-butoxide, 99% (metals basis) 1g 371元 2010/05/25 42583 四叔丁醇锆(IV), 97+% Zirconium(IV) tert-butoxide, 97+% 5g 1306元 2010/05/25 42583 四叔丁醇锆(IV), 97+% Zirconium(IV) tert-butoxide, 97+% 25g 5712元
  • 敏感性:Moisture Sensitive
  • TSCA:No
  • F:1-10
  • MOL 文件:2081-12-1.mol
  • Alfa Aesar:四叔丁醇锆(IV),99.99%(metalsbasis) Zirconium(IV) tert-butoxide, 99.99% (metals basis)(2081-12-1)

系列性分类

  1. Materials Science 材料科学
  2. Micro/NanoElectronics - Materials Science
  3. Vapor Deposition Precursors - Micro/NanoElectronics
  4. CVD and ALD Precursors Packaged for Deposition Systems - Vapor Deposition Precursors
  1. Materials Science 材料科学
  2. Micro/NanoElectronics - Materials Science
  3. Solution Deposition Precursors - Micro/NanoElectronics
  4. Zirconium - Solution Deposition Precursors
  1. Chemical Synthesis 化学合成
  2. Catalysis and Inorganic Chemistry 催化剂和无机化学
  3. Zirconium 锆x
  1. CVD & ALD Precursors
  1. CVD & ALD Precursors
  1. Alkoxide
  2. Zirconium
  1. CVD & ALD Precursors
  2. Zirconium
  1. Metal Alkoxides for CVD & ALD
  2. Zirconium

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