Hafnium tert-butoxide 叔丁醇铪
CAS 2172-02-3 MFCD00070458
化学结构图
SMILES: CC(C)(C)[O-].CC(C)(C)[O-].CC(C)(C)[O-].CC(C)(C)[O-].[Hf+4]
化学属性
| Mol. Formula | Hf[OC(CH3)3]4 |
|---|---|
| Mol. Weight | 470.94 |
| Refractive index | n20/D 1.424(lit.) |
| Boiling Point | 90 °C/5 mmHg(lit.) |
| Density | 1.166 g/mL at 25 °C(lit.) |
| Flash Point | 28°(82°F) |
| TSCA | No |
| Solubility | Soluble in hydrocarbons, reacts with alcohols, ketones, and esters |
| Melting Point | 2° |
| Stability | light sensitive, moisture sensitive |
| Appearance | liq. (may contain small amount of white sediment) |
别名和识别编码
| Chemical Name | Hafnium tert-butoxide |
|---|---|
| CAS Number | 2172-02-3 |
| PubChem Substance ID | 9934444 |
| MDL Number | MFCD00070458 |
| Synonym | Tetrakis(tert-butoxy)hafnium {LY} Tetrakis(tert-butoxy)hafnium {} {LY} Tetrakis(tert-butoxy)hafnium {} {} {LY} Tetrakis(tert-butoxy)hafnium {} {} {} {LY} Tetrakis(tert-butoxy)hafnium {} {} {} {} {LY} Tetrakis(tert-butoxy)hafnium {} {} {} {} {} {LY} Tetrakis(tert-butoxy)hafnium {} {} {} {} {} {} {LY} Tetrakis(tert-butoxy)hafnium {} {} {} {} {} {} {} {LY} Tetrakis(tert-butoxy)hafnium {} {} {} {} {} {} {} {} {LY} Tetrakis(tert-butoxy)hafnium {} {} {} {} {} {} {} {} {} {LY} Tetrakis(tert-butoxy)hafnium {} {} {} {} {} {} {} {} {} {} {} {} {} {} {} {} {} {} {} {} {LY} Tetrakis(tert-butoxy)hafnium {} {} {} {} {} {} {} {} {} {} {} {LY} Tetrakis(tert-butoxy)hafnium {} {} {} {} {} {} {} {} {} {} {} {} {} {} {} {} {} {} {} {} {} {} {} {} {LY} Tetrakis(tert-butoxy)hafnium {} {} {} {} {} {} {} {} {} {} {} {} {} {LY} Tetrakis(tert-butoxy)hafnium {} {} {} {} {} {} {} {} {} {} {} {} {} {} { {} {} {} {} {} {} {} {} {} {} {} {} {} {} {LY} Tetrakis(tert-butoxy)hafnium {} {} {} { |
| Chemical Name Translation | 叔丁醇铪 |
| InChI | InChI=1S/4C4H9O.Hf/c4*1-4(2,3)5;/h4*1-3H3;/q4*-1;+4 |
| LabNetwork Molecule ID | LN01237189 |
| Canonical SMILES | OC(C)(C)C.[Hf].[1/4] |
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分类
- Hafnium, Materials Science, Micro/NanoElectronics, Solution Deposition Precursors
- {SNA} 72: Hafnium, CVD and ALD Precursors Packaged for Deposition Systems, CVD and ALD Precursors by Metal, Hafnium, Micro/NanoElectronics, Vapor Deposition Precursors, 材料科学
- {SNA} Hafnium, Materials Science, Micro/Na
相关文献及参考
- Williams, P. A.; et al J. Mater. Chem. 2nd ed., 12 , 165, (2002)
- Dabrian, A.; et al. Cryst. Growth Des. 1st ed., 11 , 203, (2011)
安全信息
GHS Symbol
- H225 Highly flammable liquid and vapour 高度易燃液体和蒸气
- H226 Flammable liquid and vapour 易燃液体和蒸气
- H302 Harmful if swallowed 吞食有害
- H315 Causes skin irritation 会刺激皮肤
- H319 Causes serious eye irritation 严重刺激眼睛
- H335 May cause respiratory irritation 可能导致呼吸道刺激
- P210 Keep away from heat/sparks/open flames/hot surfaces. — No smoking. 远离热源/火花/明火/热的表面。——禁止吸烟。
- P233 Keep container tightly closed. ?保持容器密闭。
- P240 Ground/bond container and receiving equipment. 与地面接触/连接集装箱和接受设备。
- P241 Use explosion-proof electrical/ventilating/lighting/…/equipment. 使用防爆电气/通风/照明/ .../设备。
- P242 Use only non-sparking tools. 只能使用无火花工具。
- P243 Take precautionary measures against static discharge. 采取预防措施，防止静电放电。
- P261 Avoid breathing dust/fume/gas/mist/vapours/spray. 避免吸入粉尘/烟/气体/烟雾/蒸汽/喷雾。
- P264 Wash hands thoroughly after handling. 处理后要彻底洗净双手。
- P270 Do not eat, drink or smoke when using this product. 使用本产品时不要吃东西，喝水或吸烟。
- P271 Use only outdoors or in a well-ventilated area.? 只能在室外或通风良好的地方使用。
- P280 Wear protective gloves/protective clothing/eye protection/face protection. 戴防护手套/防护服/眼睛的保护物/面部保护物。
- P301+P312
- P302+P352
- P303+P361+P353
- P304+P340
- P305+P351+P338
- P312 Call a POISON CENTER or doctor/physician if you feel unwell. 如果你感觉不适，呼叫解毒中心或医生/医师。
- P321 Specific treatment (see … on this label). 具体治疗（见本标签上的）。
- P330 Rinse mouth. 漱口
- P332+P313
- P337+P313
- P362 Take off contaminated clothing and wash before reuse. 脱掉污染的衣服，清洗后方可重新使用
- P370+P378
- P403+P233
- P403+P235
- P405 Store locked up. 上锁保管。
- P501 Dispose of contents/container to..… 处理内容物/容器.....
- S26 In case of contact with eyes, rinse immediately with plenty of water and seek medical advice 眼睛接触后，立即用大量水冲洗并征求医生意见；
- S37 Wear suitable gloves 戴适当手套；
- S16 Keep away from sources of ignition - No smoking 远离火源，禁止吸烟；
- S60 This material and its container must be disposed of as hazardous waste 该物质及其容器必须作为危险废物处置；
- S23 Do not breathe gas/fumes/vapour/spray (appropriate wording to be specified by the manufacturer) 不要吸入气体/烟雾/蒸汽/喷雾；
- R10 Flammable 易燃
- R36/37/38 Irritating to eyes, respiratory system and skin 对眼睛、呼吸系统和皮肤有刺激性
- R36/38 Irritating to eyes and skin 对眼睛和皮肤有刺激性
其他信息
- 敏感性:Moisture Sensitive/Light Sensitive
- 丁氧铪价格(试剂级):更新日期 产品编号 产品名称 包装 价格 2010/05/25 41908 叔丁醇铪, 99.9% (metals basis excluding Zr), Zr< 0.2% Hafnium tert-butoxide, 99.9% (metals basis excluding Zr), Zr< 0.2% 50g 18060元 2010/05/25 41908 叔丁醇铪, 99.9% (metals basis excluding Zr), Zr< 0.2% Hafnium tert-butoxide, 99.9% (metals basis excluding Zr), Zr< 0.2% 2g 1131元 2010/05/25 41908 叔丁醇铪, 99.9% (metals basis excluding Zr), Zr< 0.2% Hafnium tert-butoxide, 99.9% (metals basis excluding Zr), Zr< 0.2% 10g 4746元
- Alfa Aesar:<0.2% Hafnium tert-butoxide, 99.9% (metals basis excluding Zr), Zr< 0.2%(2172-02-3)" href="http://www.alfa.com/zh/GP100w.pgm?DSSTK=41908&CAS;=2172-02-3">叔丁醇铪,99.9%(metalsbasisexcludingZr),Zr<0.2% Hafnium tert-butoxide, 99.9% (metals basis excluding Zr), Zr< 0.2%(2172-02-3)
- Sigma Aldrich:2172-02-3(sigmaaldrich)
- TSCA:No
- MOL 文件:2172-02-3.mol
