Bis(Ethylcyclopentadienyl)Ruthenium(II) Ru(EtCp)2 双(乙基环戊二烯基)钌(II)
CAS 32992-96-4 MFCD03427334
化学结构图
SMILES: CC[C]1[CH][CH][CH][CH]1.CC[C]1[CH][CH][CH][CH]1.[Ru]
化学属性
| Mol. Formula | C7H9RuC7H9 |
|---|---|
| Mol. Weight | 287.36 |
| Refractive index | n20/D 1.5870(lit.) |
| Boiling Point | 100 °C/0.01 mmHg(lit.) |
| Density | 1.3412 g/mL at 25 °C(lit.) |
| Melting Point | 6 °C(lit.) |
| Appearance | pale yellow liq. |
| Danger-Level | - |
| pH | -:- |
| Redox | - |
别名和识别编码
| Chemical Name | Bis(Ethylcyclopentadienyl)Ruthenium(II) |
|---|---|
| Synonym | 双(乙基环戊二烯)钌(II) Ru(EtCp)2 二乙基二茂钌 二乙基二茂钌 Ru(EtCp)2 |
| CAS Number | 32992-96-4 |
| PubChem Substance ID | 24883596 |
| MDL Number | MFCD03427334 |
| Chemical Name Translation | 双(乙基环戊二烯基)钌(II) |
| LabNetwork Molecule ID | LN00200983 |
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分类
- {SNA} CVD and ALD Precursors by Metal, Catalysis and Inorganic Chemistry, Chemical Synthesis, Micro/NanoElectronics, Ru Catalysts, Ruthenium, Ruthenium Catalysts, Vapor Deposition Precursors, 材料科学
- {SNA} 44: Ruthenium, CVD and ALD Precursors Packaged for Deposition Systems, CVD and ALD Precursors by Metal, Catalysis and Inorganic Chemistry,
- {SNA} 44: R
- {SNA} CVD and ALD Pre
- {SNA} 44: Ruthenium,
- {SNA} 44: Ruthenium, CVD and ALD Precursors Packaged for Deposition Systems, CVD and ALD Precursors by Metal, Catalysis and Inorganic Chemistry, Chemical Synthesis, Micro/NanoElectronics, Ru Catalysts, Ruthenium, Ruthenium Catalysts, Vapor Deposition Precursors,
安全信息
GHS Symbol
- H315 Causes skin irritation 会刺激皮肤
- H319 Causes serious eye irritation 严重刺激眼睛
- H335 May cause respiratory irritation 可能导致呼吸道刺激
- P261 Avoid breathing dust/fume/gas/mist/vapours/spray. 避免吸入粉尘/烟/气体/烟雾/蒸汽/喷雾。
- P305+P351+P338
- S26 In case of contact with eyes, rinse immediately with plenty of water and seek medical advice 眼睛接触后，立即用大量水冲洗并征求医生意见；
- R36/37/38 Irritating to eyes, respiratory system and skin 对眼睛、呼吸系统和皮肤有刺激性
