Boc-methoxyphenyldiphenylsulfonium triflate 叔丁氧羰基-甲氧基苯基二苯锍三氟甲磺酸酯
CAS 180801-55-2 MFCD02683567
化学结构图
SMILES: CC(C)(C)OC(=O)COC1C=CC(=CC=1)[S+](C1C=CC=CC=1)C1C=CC=CC=1.[O-]S(=O)(=O)C(F)(F)F
化学属性
| Mol. Formula | C25 |
|---|---|
| Mol. Weight | 543 |
| Melting Point | 104-108 °C(lit.) |
别名和识别编码
| Chemical Name | Boc-methoxyphenyldiphenylsulfonium triflate |
|---|---|
| Synonym | 叔丁氧羰基-甲氧基苯基二苯锍三氟甲磺酸酯 (叔丁氧基羰基甲氧基苯基)二苯基锍三氟甲磺酸酯 (叔丁氧基羰基甲氧基苯基)二苯基锍三氟甲磺酸酯 叔丁基(4-(二苯基)锍)苯氧乙酸三氟甲磺酸酯 叔丁基(4-(二苯基)锍)苯氧乙酸三氟甲磺酸酯 |
| MDL Number | MFCD02683567 |
| PubChem Substance ID | 24874593 |
| CAS Number | 180801-55-2 |
| Chemical Name Translation | 叔丁氧羰基-甲氧基苯基二苯锍三氟甲磺酸酯 |
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分类
- {SNA} Cationic Photoinitiators,
- {SNA} Cationic Photoinitiators, Materials Science, Micro/NanoElectronics, Organic Photoinitiators, Photoacid Generators (PAGs),
- {SNA} Cationic Photoinitiators, Micro/NanoElectronics, Organic Photoinitiators, Photoacid Generators (PAGs), Photoresists, Polymer Science, Polymerization Initiators, Reagents for Polymerization, Self Assembly and Lithography, 材料科学
- {SA} Cationic Photoinitiators, Materials Science, Micro/NanoElectronics, Organic Photoinitiators, Photoacid Generators (PAGs), Photoresists, Polymer Science, Polymerization Initiators, Self Assembly & Contact Printing
安全信息
GHS Symbol
- P261 Avoid breathing dust/fume/gas/mist/vapours/spray. 避免吸入粉尘/烟/气体/烟雾/蒸汽/喷雾。
- P305+P351+P338
- H315 Causes skin irritation 会刺激皮肤
- H319 Causes serious eye irritation 严重刺激眼睛
- H335 May cause respiratory irritation 可能导致呼吸道刺激
- S26 In case of contact with eyes, rinse immediately with plenty of water and seek medical advice 眼睛接触后，立即用大量水冲洗并征求医生意见；
- S36 Wear suitable protective clothing 穿戴适当的防护服；
- R36/37/38 Irritating to eyes, respiratory system and skin 对眼睛、呼吸系统和皮肤有刺激性
